Yun-Yan Lee

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About

Yun-Yan Lee is a researcher whose work centers on precision engineering and semiconductor manufacturing, with a particular focus on wafer positioning and defect detection systems. His most notable contribution is the development of a laser scanning method for wafer positioning, which integrates a laser scanner and a scattering light receiving system to enhance accuracy in semiconductor processing. By reflecting a laser beam into a scanning line on the sensing area, Lee’s method enables precise detection as wafers pass through, improving alignment and reducing errors in fabrication. While his most-cited paper, "Wafer positioning by laser scanning method" (2011), has garnered 2 citations, it represents a foundational step in advancing automated optical inspection techniques. Lee’s work contributes to the broader field of metrology and process control, offering practical solutions for high-precision manufacturing environments. His research underscores the importance of optical systems in streamlining semiconductor workflows, making him a valuable figure for students and researchers exploring laser-based positioning and quality assurance in electronics production.