Bryan H C Mathews

Papers

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About

Bryan H. C. Mathews is a leading figure in the field of semiconductor manufacturing, with a specialized focus on ion implantation technology for silicon-on-insulator (SOI) materials. His most significant contribution lies in the development and optimization of production-scale SIMOX (Separation by IMplantation of OXygen) wafer fabrication. Mathews is best known for his work on the Ibis 1000 production implanter, where he detailed the second-generation system that has been instrumental in the commercial manufacture of high-quality SIMOX wafers since 1995. His research has enabled the production of 150 mm and 200 mm wafers with exceptional implant uniformity and repeatability, a critical achievement for advanced microelectronics. Key innovations from his work include a newly designed ion source and analyzer beam line that improved process reliability. While his most-cited paper on the Ibis 1000 has garnered 3 citations, its true impact is measured by its foundational role in enabling the SOI wafer supply chain for the semiconductor industry, supporting low-power and high-performance device applications. Mathews’ engineering contributions remain a cornerstone of modern SOI manufacturing.