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New integrated silicon-PDMS process for compliant micro-mechanisms

Wissem Haouas, Redwan Dahmouche, Joël Agnus, Nadine Le Fort-Piat, Guillaume J. Laurent

Year
2017
Citations
12

Abstract

Polydimethylsiloxane (PDMS) elastomers are used for many applications, such as microfluidics and micro-engineering. This paper presents a new process of integrating soft elastomers into a silicon structure without any assembly steps. The novelty of this process is the use of only one deep reactive ion etch (DRIE) instead of two or more as developed in previous works. Thus, this fabrication process allows the use of elastomers that are usually not compatible with some fabrication processes. Compliant flexures with different interference shapes have been designed, simulated, fabricated, and characterized for generic use and notably for micro-robot joints and compliant micro-systems. The experimental results show that the 400 μm × 400 μm cross-sectional area samples can be bended more than without delamination.

Keywords

Deep reactive-ion etchingPolydimethylsiloxaneFabricationMaterials scienceElastomerMicrofluidicsProcess (computing)SiliconNanotechnologyReactive-ion etching

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