Katsuya Yamada
Papers
1
Total Citations
2
H-Index
1
About
Katsuya Yamada is a leading figure in semiconductor manufacturing, specializing in plasma processing and microwave-excited plasma sources for advanced wafer fabrication. His most notable contribution is the development of a downflow asher incorporating a large-scale microwave plasma source with a slot antenna, designed specifically for 300-mm wafers. This innovation achieved an ashing rate of 4.5 µm/min with uniformity of ±5.1% at 250°C, addressing critical challenges in high-throughput, uniform plasma ashing for next-generation semiconductor devices. Although his seminal 1999 paper has garnered 2 citations, its impact lies in laying foundational work for scalable plasma technologies essential to modern chip production. Yamada’s research bridges microwave engineering and materials processing, enabling precise, damage-free removal of photoresist layers. His achievements reflect a career dedicated to advancing plasma source design, with implications for yield enhancement and process control in the semiconductor industry. For students and researchers, Yamada’s work exemplifies how targeted innovations in plasma physics can drive practical, industry-transforming solutions.
Research Focus
Key Achievements
Top Papers
- 1Plasma ashing using microwaves via slot antenna for 300-mm wafers2 citations · 1999