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Bob Becker is a pioneer in advanced lithographic inspection technologies, with his most influential work centered on electron-beam systems for semiconductor manufacturing. His landmark 1991 paper, "An electron-beam inspection system for x-ray mask production," introduced SEMSpec, a scanning electron-beam inspection system that revolutionized die-to-die inspections of conductive x-ray masks, wafer prints, and stencil masks. This system offered remarkable flexibility, allowing users to tune inspection sensitivity from 97% detection of 50-nm defects at a rate of 27 minutes per square centimeter. Becker's contributions have been foundational in enabling high-resolution defect detection critical for next-generation lithography, directly impacting the production of smaller, more reliable semiconductor devices. With 14 citations on this seminal work, his research continues to influence the field of mask inspection and metrology. Becker's achievements underscore his role as a key innovator in the transition from optical to electron-beam inspection methods, providing essential tools for the semiconductor industry's pursuit of ever-shrinking feature sizes. His work remains a cornerstone for researchers and engineers developing advanced manufacturing processes.