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Development of a Cluster Tool and Analysis of Deposition of Silicon Oxide by TEOSO<sub>2</sub> PECVD

Nilton Itiro Morimoto, Jacobus W. Swart

发表年份
1996
引用次数
8

关键词

Materials sciencePlasma-enhanced chemical vapor depositionWaferAnalytical Chemistry (journal)OxideChemical vapor depositionSilicon oxideAnnealing (glass)EllipsometryDeposition (geology)

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