Papers
1
Total Citations
2
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About
Y. Meas is a materials scientist whose research focuses on the scalable synthesis and deposition of two-dimensional nanomaterials, particularly graphene oxide, for advanced thin-film technologies. Their most notable contribution is the development of an automated atmospheric pressure plasma jet deposition method that enables the self-assembly of lamellar graphene oxide particles into continuous thin and thick films—a breakthrough that addresses key challenges in producing uniform, large-area coatings without the need for vacuum systems. This work, published in 2023, has already garnered 2 citations, signaling early recognition for its potential in flexible electronics, sensors, and barrier coatings. Meas’s research uniquely bridges plasma physics, colloid chemistry, and materials engineering, offering a practical route to integrating graphene-based materials into industrial manufacturing processes. Their achievements highlight a commitment to translating fundamental nanomaterial properties into real-world applications, making their work essential reading for researchers exploring scalable deposition techniques and the functionalization of 2D materials.
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Top Papers
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